About: http://webisa.webdatacommons.org/422370039

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Subsequently, the gate metal layer is patterned by the photolithography process using the first mask and the etching process thereby forming the gate patterns including a gate line 2, a gate electrode 8, and a gate pad 28.
http://www.w3.org/ns/prov#wasQuotedFrom	google.de