About: http://webisa.webdatacommons.org/42458354

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	As described in the foregoing, the process speed is increased in any application to such as a film formation, an etching and an ashing by using a plasma apparatus and a plasma process according to the present invention.
http://www.w3.org/ns/prov#wasQuotedFrom	google.fr