About: http://webisa.webdatacommons.org/425444053

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Other materials can be used for capping, such as photoresist, silicon dioxide, or other suitable material resistant to the etching process, but silicon nitride is a presently preferred material.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com.au