| http://www.w3.org/ns/prov#value | - An SiO2 film as an insulating film is formed on the patterned ITO film 17 by sputtering, and then patterned to remain in the regions other than the regions where light emitting portions are seen from the side of the glass substrate (not shown), so that SiO2 films 18 are formed (see FIG. 5E).
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