About: http://webisa.webdatacommons.org/427211802

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	In a conventional plasma etching apparatus, a reactive gas such as CF4 is supplied to a chamber having parallel plate electrodes, and 13.56-MHz RF power is supplied across the electrode having a wafer thereon.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com