| http://www.w3.org/ns/prov#value | - rocess, as described above, to remove contaminants, particulate matter, residues, and oxides that may have formed on the exposed portions of the contact/via openings 516, the line openings 520, and the conductive feature 502. [0064] The metallization structure is then formed with a conductive material such as aluminum, copper, tungsten or combinations thereof.
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