| http://www.w3.org/ns/prov#value | - Also, other than the three-layer structure, the gate insulating films 16 and 66 may have any other structure such as a two-layer structure consisting of a silicon oxide film and a silicon nitride film, or a one-layer structure only including a silicon nitride film, as long as the structure includes at least one film that is capable of capturing electrons.
|
