About: http://webisa.webdatacommons.org/438324489

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Another example of the present invention is to insert an additional step after the excessive etching of the gate insulation film 3 of FIG. 3(a) and before the forming of the thermally oxidized film 13 of FIG. 3(b).
http://www.w3.org/ns/prov#wasQuotedFrom	google.com