About: http://webisa.webdatacommons.org/438538580

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Typically CMP polishing slurries contain an abrasive material, such as silica or alumina, suspended in an oxidizing, aqueous medium.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es