About: http://webisa.webdatacommons.org/439210646

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	As described above, in accordance with the present invention, there is an advantage of preventing or minimizing damage to an etch stop layer via a smooth photolithography process, in forming a dual damascene wiring pattern.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com