About: http://webisa.webdatacommons.org/439475579

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	More particularly, the present invention relates to a method of and apparatus for baking a substrate, such as a silicon wafer, on which a layer of photoresist has been formed. 2.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com