About: http://webisa.webdatacommons.org/44162465

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Next, after the photoresist films 16 are removed, both dry etching residue and photoresist residue attached on the surface of the semiconductor substrate 1 are removed by using an etching solution such as hydrofluoric acid or the like.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com