About: http://webisa.webdatacommons.org/443965390

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The preferred amount of taper, adequate for appropriate chemical vapor deposition filling of a dielectric material such as silicon dioxide will in part depend on the groove width as will become clear from FIG. 6.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com