| http://www.w3.org/ns/prov#value | - This article is a companion piece to the author???s discussion about the choices to be made among lithography options for the 22nm half-pitch node, in the February issue of Solid-State Technology.)February 5, 2010 ??? In 2009, the International EUVL Symposium Steering Committee [1] ranked the top three critical issues/focus areas for extreme ultraviolet lithography (EUVL) as:
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