About: http://webisa.webdatacommons.org/444627416

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	This isolation structure 10 is typically formed by patterning trenches into a silicon substrate 12 and filling the trenches with an insulating material such as silicon dioxide (known as shallow trench isolation).
http://www.w3.org/ns/prov#wasQuotedFrom	google.com