About: http://webisa.webdatacommons.org/445332621

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Using the method of this invention to polish a workpiece, especially a semiconductor wafer, wherein a finishing sensor subsystem changes an operative finishing composition feed mechanism in situ is preferred.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es