| http://www.w3.org/ns/prov#value | - Patent US6663470 - Method and apparatus for releasably attaching a polishing pad to a chemical ... - Google PatentsSearch Images Maps Play YouTube News Gmail Drive More ??Sign inAdvanced Patent SearchPatentsA method and apparatus for releasably attaching a planarizing medium, such as a polishing pad, to the platen of a chemical-mechanical planarization machine.
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