PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • In a second step of the process of the present invention, defects such as waveguides, cavities, etc., are patterned in photoresist layer 12 using an electron beam 14 as shown in FIG. 1( c).
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