About: http://webisa.webdatacommons.org/451519960

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	A method of manufacturing a semiconductor device according to claim 1, wherein the gas introduced to the chamber at the trench forming step is gas including one of SF6 gas and Cl2 gas.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es