PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • 1.FIELD The present invention relates to a lithographic apparatus and a method for manufacturing a device. 2.BACKGROUND A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate.
http://www.w3.org/ns/prov#wasQuotedFrom
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