About: http://webisa.webdatacommons.org/45479869

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	After deposition of layer 130, a new process gas is introduced into the chamber, while temperature, pressure and other processing conditions are controlled to deposit SACVD silicon oxide layer 633 (step 210).
http://www.w3.org/ns/prov#wasQuotedFrom	google.com