About: http://webisa.webdatacommons.org/456493618

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	In the case in which the intermediate layer is formed of an inorganic material such as silicon oxide or silicon nitride, the etching step can be performed with a solution etch or a plasma etch.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com