About: http://webisa.webdatacommons.org/46158715

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Gate oxide, silicon oxide, silicon nitride, polysilicon, and other films may be deposited on silicon to form the transistor gate structures through successive deposition, patterning and etching steps.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com