About: http://webisa.webdatacommons.org/47178100

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	After that, a mask 5 shown in FIG. 1E is patterned by selectively removing the exposed silicon oxide film 3 by a dry etching method such as reactive ion etching, using the patterned silicon nitride film 4 as a mask.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com