| http://www.w3.org/ns/prov#value | - c.Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitrideUS754092017 Oct 20032 Jun 2009Applied Materials, Inc.Silicon-containing layer deposition with silicon compoundsUS756035217 Mar 200614 Jul 2009Applied Materials, Inc.Selective depositionUS75727157 May 200711 Aug 2009Applied Materials,
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