| http://www.w3.org/ns/prov#value | - Accordingly, an object of the present invention is to provide a radiation-sensitive composition used as a chemically-amplified resist showing sensitivity to radiation such as deep ultraviolet rays represented by a KrF excimer laser and an ArF excimer laser, particularly exhibiting superior dry etching resistance without being affected by types of etching gases, having high radiation transmittance,
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