| http://www.w3.org/ns/prov#value | - According to a first process for improving the electrically insulating property of an electrically insulating layer which is to be deposited, for example of a silicon oxynitride or silicon oxide layer, the deposition process is interrupted at least once and then continued after a predeterminable waiting time, so that the electrically insulating layer is formed from n+1 part-layers, n being the num
|
