| http://www.w3.org/ns/prov#value | - Accordingly, the wafer W after the acidic cleaning treatment in the foregoing step is now subjected to an alkaline cleaning treatment equivalent tothe SC-1 cleaning treatment.Although the given description above is given of the sequence of treatments in which the first step is an acidic cleaning treatment and the second step is an alkaline cleaning treatment, it is of course a possible case that t
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