| http://www.w3.org/ns/prov#value | - contacting a solution including imprinting materials and a polymeric fluorinated surfactant;US2005018733923 Feb 200425 Aug 2005Molecular Imprints, Inc.Materials for imprint lithographyUS2005019242127 Feb 20041 Sep 2005Molecular Imprints, Inc.May be used as an etch mask for a patterned imprinted layer comprising protrusions and recessionsUS2005023673922 Feb 200527 Oct 2005Board Of Regents, The Univ
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