| http://www.w3.org/ns/prov#value | - Accordingly, the oxygen free etch plasma P at a high temperature H or the substantially oxygen free etch plasma P at a high temperature H will typically occur at a temperature above 200??? C. For example, a high temperature H between about 350??? C. and about 550??? C. is suitable for some materials such as noble metals (e.g., Pt, Ir, and Ru), CMO (e.g., perovskites, LNO, and PCMO), dielectric mat
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