About: http://webisa.webdatacommons.org/52530152

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The endpoint time of each wafer or each batch of wafers may be different from each other, and therefore the end etch time especially optimized for deposition thickness variations and topography when using optical etch plasma endpointing.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es