About: http://webisa.webdatacommons.org/52565629

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The following is a description of a first embodiment wherein the present invention has been applied to a vacuum processing apparatus which implements a required processing to a semiconductor wafer under an atmosphere of reduced pressure.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com