PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • The selective epitaxy, in an embodiment, includes exposing a silicon surface to a gas mixture including H2 and SiH2Cl2 in a temperature range between 600-800 degrees C. In an embodiment, the selective epitaxy is a molecular beam epitaxy.
http://www.w3.org/ns/prov#wasQuotedFrom
  • google.es