| http://www.w3.org/ns/prov#value | - The third insulating film 512 is formed by a single layer or a stacked layer made from an inorganic material such as silicon oxide, silicon nitride, silicon oxynitride, or silicon nitride oxide; an organic material such as polyimide, polyamide, benzocyclobutene, acrylic, or epoxy; siloxane; or the like by a known method.
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