| http://www.w3.org/ns/prov#value | - For example, each of the insulating layers 836 and 838 is formed using an inorganic insulating material such as silicon oxide, silicon nitride, silicon oxynitride, or silicon nitride oxide; or an insulating material containing carbon such as DLC (diamond-like carbon) by a CVD method, a sputtering method, or an ALD method.
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