About: http://webisa.webdatacommons.org/57992818

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	FIG. 4 is a graph showing that an increase in oxygen content of a plasma source gas has a diminishing effect on the etch rate of a silicon oxide substrate, when all other process variables are held constant.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com