About: http://webisa.webdatacommons.org/59316975

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	A photoresist composition can be prepared by blending the polymer (6) with a solvent, a photoacid generator and, if necessary, a basic compound, a surfactant and other additives each described later.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com