PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • A method as claimed in claim 1 in which said substrate is a semiconductor wafer and said refractory metal nitride layer is deposited in a contact hole having an aspect ratio of 4:1 or greater.
http://www.w3.org/ns/prov#wasQuotedFrom
  • google.com