| http://www.w3.org/ns/prov#value | - This layer is preferably Ti/TiN, Ti/TiW, Ti/TiWN, Ti/TiN from Ti nitriation using N2 or NH3 at 700??? C., or TiN only, or the like and is deposited by physical vapor deposition, such as by sputtering, to a thickness of between about 800 to 2000 Angstroms.
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