| http://www.w3.org/ns/prov#value | - In alternate embodiments, the gate electrode layer 206 may comprise metals such as titanium (Ti), tantalum (Ta), and the like, and/or metal-containing compounds, such as tantalum nitride (TaN), titanium nitride (TiN), tantalum silicon nitride (TaSiN), titanium silicon nitride (TiSiN), and the like.
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