| http://www.w3.org/ns/prov#value | - The third insulating film 112 is formed using a signle layer or a stacked layer made from an inorganic material such as silicon oxide, silicon nitride, silicon oxynitride, or silcion nitride oxide; an organic material such as polyimide, polyamide, benzocychlobutene, acrylic, or epoxy; siloxane, or the like, by a known method.
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