| http://www.w3.org/ns/prov#value | - For example, while the description above is given for a method and apparatus for cleaning and drying semiconductor substrates, it would be possible to implement the invention in the manufacture of raw wafers, disks and heads, flat panel displays, microelectronic masks, and other applications requiring high purity wet processing such as steps of rinsing, cleaning, drying and the like.
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