About: http://webisa.webdatacommons.org/75169364

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention according to another aspect is an apparatus for setting a processing condition in a photolithography process of forming a resist pattern on a substrate.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com