| http://www.w3.org/ns/prov#value | - e for exposing a region of said second photoresist which correspond other regions except regions sandwiched between the pair of the aperture patterns for light transmission; the step of patterning by developing said exposed second photoresist; and the step of processing said first film to be processed under said second photoresist using said patterned second photoresist as a mask. 17.
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