| http://www.w3.org/ns/prov#value | - The source and drain electrodes 104 a and 104 b are formed after depositing an inorganic material such as SiNx or SiOx, an amorphous silicon, and an impurity doped amorphous silicon by the PCVD (plasma chemical vapor deposition) method, and patterning the data bus line 102 in order to have holes (S2).
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