| http://www.w3.org/ns/prov#value | - For many applications, a metal precursor is employed for the ALD process, e.g., an ALD metal precursor can be provided as ML., where M=Al, Ha, Mg, W, Ta, Si, or other metal, and L=CH3, Cl, F, C4H9, or other atomic or molecular ligand that produces a volatile molecule.
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