About: http://webisa.webdatacommons.org/82259689

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	US2003012522525 Nov 20023 Jul 2003Chongying XuChemical formulations and methods for removing unwanted material, such as unexposed photoresist, metal oxides, CMP residue, and the like, from semiconductor wafers or other substrates.
http://www.w3.org/ns/prov#wasQuotedFrom	google.ca