| http://www.w3.org/ns/prov#value | - Substrate 100 is depicted in FIG. 3 with a thin pad oxide layer 203 and a nitride layer 205 deposited over it using typical deposition processes, for example the depositions may be a chemical vapor deposition, a plasma enhanced deposition, or any other blanket deposition known in the art, such as reduced pressure CVD or others.
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