| http://www.w3.org/ns/prov#value | - A fifth aspect of the present invention is a method of fabricating a photomask, comprising: providing a transparent substrate having an opaque coating; forming a cell region by removing first areas of the opaque coating, the cell region comprising one or more chip regions and one or more kerf regions; forming a copy region by removing second areas of the opaque coating, the copy region comprising
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