| http://www.w3.org/ns/prov#value | - A first aspect of the present invention is a method for forming a contact, comprising: forming a dielectric isolation in a substrate, the substrate having a frontside and an opposing backside; forming a first dielectric layer on the frontside of the substrate; forming a trench in the first dielectric layer, the trench aligned over and within a perimeter of the dielectric isolation and extending to
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